Atomic Layer Deposition ALD

What is an ALD coating?

ALD is a deposition process which allows the deposition of thin films under vacuum thanks to gaseous pre-cursors.

The parts to be treated are placed in a vacuum machine.

After introduction of a pre-cursor A which deposit on all of the part’s surface, a pre-cursor B is introduced and reacts with the first atoms deposited to form the first atomic layer.

This cycle is repeated until the correct thickness is obtained.

Deposition temperature is between 150 and 200°C.


Application examples

Barrier properties

Excellent diffusion barrier properties
Application:
Sensitive substrates
Constraints: Barrier layer
Solutions: ALD coatings

Identification

Intense color for better identification on steel, stainless steel, titanium, aluminum parts, etc.
Application:
External fixators
Constraints: Biocompatibility, homogeneous color, mechanical resistance
Solutions: Colored ALD coatings

Biocompatibility
Application:
Stents
Constraints: Barrier layer and 300% deformation on stainless steel parts
Solutions: ALD TiNO coating, …

Fiche technique ALD