Atomic layer deposition (ALD) – Procedure
ALD is a procedure of chemical deposition in the gaseous phase whereby a thin film of metallic oxides (AL2O3, TiO2, …) is made at the nanometric scale.
ALD is an innovative technology for making protective and decorative coatings.
Conforms to REACH and RoHS standards.
Main applications of ALD deposits
Excellent properties as a diffusion barrier
Application: Sensitive substrates
Constraints: Barrier layer
Solution: ALD coating
Intense color for a better identification on parts made from steel, stainless steel, titanium, aluminum …
Application: External fixers
Constraints: Biocompatibility, homogenous color, mechanical resistance
Solution: Colorized ALD coatings
Constraints: Barrier layer and 300% deformation on steel parts
Solution: ALD TiNO coating …